Effect of Heat Treatment on Electrical Properties of Amorphous Oxide Semiconductor In–Ga–Zn–O Film as a Function of Oxygen Flow Rate

标题
Effect of Heat Treatment on Electrical Properties of Amorphous Oxide Semiconductor In–Ga–Zn–O Film as a Function of Oxygen Flow Rate
作者
关键词
-
出版物
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 48, Issue 8, Pages 08HK02
出版商
Japan Society of Applied Physics
发表日期
2009-08-20
DOI
10.1143/jjap.48.08hk02

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