Comparison of Tantalum Nitride Films for Different NH3/H2/Ar Reactant States in Two-Step Atomic Layer Deposition

出版年份 2009 全文链接

标题

作者

关键词

出版物

Volume 48, Issue 2, Pages 025504

出版商

Japan Society of Applied Physics

发表日期

2009-02-20

DOI

10.1143/jjap.48.025504

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