Evaluation of Property Changes due to Radiation, Radicals, and Ions on Organic Low-kFilms in H2/N2Plasma Etching

出版年份 2008 全文链接

标题

作者

关键词

出版物

Volume 47, Issue 5, Pages 3621-3624

出版商

Japan Society of Applied Physics

发表日期

2008-05-16

DOI

10.1143/jjap.47.3621

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now