4.3 Article

Sub-eV ion deposition utilizing soft-landing ion mobility for controlled ion, ion cluster, and charged nanoparticle deposition

期刊

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.ijms.2014.06.031

关键词

Sub-eV deposition; Soft-landing; Ion mobility; Surface enhanced Raman; MALDI; Preparative mass spectrometry

资金

  1. SRC-Center for Electronic Materials Processing and Integration Grant [2017.015]
  2. DOD-AFOSR-YIP Grant [FA 9550-08-1-0153]
  3. Toulouse Graduate School at the University of North Texas

向作者/读者索取更多资源

Sub-eV ion deposition via soft-landing ion mobility has been utilized for a variety of applications. It has allowed for the deposition of a dielectric material onto graphene without introducing defects into the lattice structure. This deposition technique has also been used for surface enhanced Raman studies. Deposited silver has also been used as an alternative MALDI matrix for low mass compounds and shows promise for imaging applications. (C) 2014 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.3
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据