Kinetics of shift of individual interfaces in Ni/Si system during low temperature reactions

标题
Kinetics of shift of individual interfaces in Ni/Si system during low temperature reactions
作者
关键词
Shift of individual interfaces, Thin films, Nano-scale
出版物
MICROELECTRONIC ENGINEERING
Volume 134, Issue -, Pages 14-21
出版商
Elsevier BV
发表日期
2015-01-14
DOI
10.1016/j.mee.2015.01.006

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