Investigation of Surface Sputtering and Post Annealing Effects on Atomic Layer Deposited ${\rm HfO}_{2}$ and ${\rm TiO}_{2}$

出版年份 2011 全文链接

标题

作者

关键词

出版物

Volume 24, Issue 2, Pages 139-144

出版商

Institute of Electrical and Electronics Engineers (IEEE)

发表日期

2011-01-14

DOI

10.1109/tsm.2011.2106167

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now