期刊
IEEE TRANSACTIONS ON PLASMA SCIENCE
卷 39, 期 3, 页码 918-924出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TPS.2010.2101618
关键词
Atmospheric microwave plasma jet; cavity ringdown spectroscopy (CRDS); far downstream; helium plasma jet; number density; OH radicals
资金
- National Science Foundation [CTS 062630]
A recent study has reported the observation of the OH radicals in the far downstream of an atmospheric argon microwave plasma jet. The far downstream is referred to as the location where the ratio of the distance from the jet orifice to the length of the jet column is greater than three. In this paper, we report that this phenomenon also exists in a similar plasma jet that is 2.5 mm long, operated in helium gas. A detailed characterization of the helium microwave plasma jet was carried out by using UV-pulsed cavity ringdown spectroscopy and optical emission spectroscopy. The absolute number densities of the OH radicals were measured along the plasma jet column from the jet orifice to the far downstream, and the OH concentrations vary from 9.64 x 10(15) near the jet orifice to 7.32 x 10(12) molecules/cm(3) in the far downstream (16 mm away from the jet orifice, corresponding to a distance ratio of 6.4). The dependence of the OH concentration on plasma power and gas flow rate at different locations along the jet axis is characterized, and the result suggests that the OH concentration increases with an increase in plasma power and gas flow rate in the downstream.
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