Low Partial Pressure Chemical Vapor Deposition of Graphene on Copper

标题
Low Partial Pressure Chemical Vapor Deposition of Graphene on Copper
作者
关键词
-
出版物
IEEE TRANSACTIONS ON NANOTECHNOLOGY
Volume 11, Issue 2, Pages 255-260
出版商
Institute of Electrical and Electronics Engineers (IEEE)
发表日期
2011-08-04
DOI
10.1109/tnano.2011.2160729

向作者/读者发起求助以获取更多资源

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started