期刊
IEEE TRANSACTIONS ON NANOTECHNOLOGY
卷 7, 期 6, 页码 683-687出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TNANO.2008.2005636
关键词
Back gate; contact resistance; mobility extraction; silicon nanowire (SiNW) FET
类别
资金
- National Research Foundation of Korea [R16-2007-007-01001-0] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
We report the electrical characteristics of backgated silicon nanowire (SiNW) FETs at temperatures ranging from 300 to 160 K. The voltage drop along the intrinsic part of the silicon nanowire (SiNW) was obtained by modeling the source/drain contacts as Schottky diodes. The field effect mobility values obtained from the extracted intrinsic voltage drop showed activation behaviors in the given temperature range. The activation energy was smaller than that of previously reported Ge nanowires.
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