TEM Study on Diffusion Process of NiFe Schottky and MgO/NiFe Tunneling Diodes for Spin Injection in Silicon

出版年份 2010 全文链接

标题

作者

关键词

出版物

Volume 46, Issue 6, Pages 2067-2069

出版商

Institute of Electrical and Electronics Engineers (IEEE)

发表日期

2010-05-28

DOI

10.1109/tmag.2010.2040594

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