4.6 Article

A Dual-Material Gate Junctionless Transistor With High-k Spacer for Enhanced Analog Performance

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IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 61, 期 1, 页码 123-128

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IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2013.2292852

关键词

Dual-material gate (DMG); high-k spacer; intrinsic gain; junctionless transistor (JLT); unity gains cutoff frequency; workfunction

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In this paper, we present a simulation study of analog circuit performance parameters for a symmetric double-gate junctionless transistor (DGJLT) using dual-material gate along with high-k spacer dielectric (DMG-SP) on both sides of the gate oxides of the device. The characteristics are demonstrated and compared with DMG DGJLT and single-material (conventional) gate (SMG) DGJLT. The DMG DGJLT presents superior transconductance (G(m)), early voltage (V-EA), and intrinsic gain (G(m)R(O)) compared with SMG DGJLT. The values are further improved for DMG-SP DGJLT, because high-k spacer enhances the fringing electric fields through the spacer.

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