The Degradation Process of High- $k~{\rm SiO}_{2}/{\rm HfO}_{2}$ Gate-Stacks: A Combined Experimental and First Principles Investigation

出版年份 2014 全文链接

标题

作者

关键词

出版物

Volume 61, Issue 5, Pages 1278-1283

出版商

Institute of Electrical and Electronics Engineers (IEEE)

发表日期

2014-04-03

DOI

10.1109/ted.2014.2313229

Discuss science. Find collaborators. Network.

Join a conversation

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started