Deep-UV Technology for the Fabrication of Bragg Gratings on SOI Rib Waveguides

In this letter, we present a wafer level technology based on deep-ultraviolet lithography to fabricate Bragg gratings on silicon-on-insulator rib waveguides. The principle of the used double-patterning technique is presented, as well the influence of the process variation on the device performances. The fabricated Bragg gratings were characterized and compared to analogue structures patterned with electron-beam lithography.