4.6 Article

Light Irradiation History Sensor Using Amorphous In-Ga-Zn-O Thin-Film Transistor Exposed to Ozone Annealing

期刊

IEEE ELECTRON DEVICE LETTERS
卷 33, 期 3, 页码 384-386

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2011.2179111

关键词

Amorphous In-Ga-Zn-O (alpha-IGZO); light irradiation history sensor; ozone annealing; thin-film transistor (TFT)

资金

  1. Materials and Structures Laboratory of Tokyo Institute of Technology

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We propose a light irradiation history sensor using an amorphous In-Ga-Zn-O (alpha-IGZO) thin-film transistor (TFT) exposed to ozone annealing at 300 degrees C. The alpha-IGZO TFT has an interesting property. The Ids-Vgs characteristic shifts positively, and the subthreshold slope becomes steep when the gate bias is applied, whereas the Ids-Vgs characteristic shifts negatively and the subthreshold slope becomes gradual when the light is irradiated. Therefore, the alpha-IGZO TFT can be used as a light irradiation history sensor by the following steps. First, the gate bias is applied to reset the Ids-Vgs characteristic. Next, the light is irradiated, and finally, the Ids-Vgs characteristic is measured, which depends on the light irradiation history.

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