4.6 Article

Influence of Illumination on the Negative-Bias Stability of Transparent Hafnium-Indium-Zinc Oxide Thin-Film Transistors

期刊

IEEE ELECTRON DEVICE LETTERS
卷 31, 期 5, 页码 440-442

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2010.2043050

关键词

Hafnium-indium-zinc oxide (HIZO); negative bias illumination stress; thin-film transistor (TFT); transparent display

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The stability of transparent hafnium-indium-zinc oxide (HIZO) thin-film transistors (TFTs) was investigated under negative-bias stress conditions. TFTs that incorporate transparent electrode materials such as indium-tin oxide or indium-zinc oxide were studied, and the bias stress experiments showed that transparent TFTs undergo severe degradation (negative shift in threshold voltage V-T) with simultaneous exposure to white light, in comparison with the results obtained in dark. The time evolution of V-T indicates that the deterioration under illumination occurs mainly by the trapping of photogenerated carriers near the HIZO/dielectric interface.

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