4.6 Article

Air-Spacer MOSFET With Self-Aligned Contact for Future Dense Memories

期刊

IEEE ELECTRON DEVICE LETTERS
卷 30, 期 12, 页码 1368-1370

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2009.2034032

关键词

Air gap technology; air-spacer technology; high speed; low-k process; RC delay

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An air-spacer transistor with self-aligned contact (SAC) is proposed. Air-spacer is created by removing the nitride spacer after the SAC plug has been formed. A three-dimensional mixed-mode simulation shows that this transistor structure has 35% smaller area, 10% faster speed, and 18% lower switching energy than a non-SAC MOSFET.

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