4.6 Article

Microwave ZnO thin-film transistors

期刊

IEEE ELECTRON DEVICE LETTERS
卷 29, 期 9, 页码 1024-1026

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2008.2001635

关键词

FET; ON/OFF ratio; pulsed laser deposition; subthreshold voltage swing; thin-film transistors (TFTs); zinc oxide (ZnO)

资金

  1. Air Force Office of Scientific Research [LRIR 07SN03COR]

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We have developed ZnO thin-film transistor design and fabrication techniques to demonstrate microwave frequency operation with 2-mu m gate length devices produced on GaAs sub strates. Using SiO2 gate insulator and pulsed laser deposited ZnO active layers, a drain-current ON/OFF ratio of 10(12), a drain-current density of 400 mA/mm, a field-effect mobility of 110 cm(2)/V center dot s, and a subthreshold gate voltage swing of 109 mV/dec were achieved. Devices with Ti-gate metal had current and power gain cutoff frequencies of 500 and 400 MHz, respectively.

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