期刊
LANGMUIR
卷 31, 期 9, 页码 2914-2921出版社
AMER CHEMICAL SOC
DOI: 10.1021/la504443a
关键词
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资金
- Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Science, ICT & Future Planning [2008-0061891, 2013R1A1A2054887]
- National Research Foundation of Korea [2013R1A1A2054887] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Graphene, a two-dimensional carbon material, has attracted significant interest for applications in flexible electronics as an alternative transparent electrode to indium tin oxide. However, it still remains a challenge to develop a simple, reproducible, and controllable fabrication technique for producing homogeneous large-scale graphene films and creating uniform patterns with desired shapes at defined positions. Here, we present a simple route to scalable fabrication of flexible transparent graphene electrodes using an oxygen plasma etching technique in a capacitively coupled plasma (CCP) system. Ascorbic acid-assisted chemical reduction enables the large-scale production of graphene with solution-based processability. Oxygen plasma in the CCP system facilitates the reproducible patterning of graphene electrodes, which allows controllable feature sizes and shapes on flexible plastic substrates. The resulting graphene electrode exhibits a high conductivity of 80 S cm(-1) and a transparency of 76% and retains excellent flexibility upon hard bending at an angle of +/-175 degrees and after repeated bending cycles. A simple LED circuit integrated on the patterned graphene film demonstrates the feasibility of graphene electrodes for use in flexible transparent electrodes.
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