Kinetics and concentration of active particles in nonequilibrium low temperature methane plasma

Electrophysical parameters and composition of HCl-N2 mixture plasmas

(2013) A. M. Efremov et al.   HIGH TEMPERATURE

The growth kinetics and optical properties of films deposited in methane glow discharge

(2012) S. M. Barinov et al.   HIGH ENERGY CHEMISTRY

Influence of addition of Ar and He on the HCl plasma parameters and composition

(2012) A. M. Efremov et al.   HIGH TEMPERATURE

Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system: the effect of different gas mixtures

(2010) M Mao et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Plasma enhanced chemical vapor deposition of a-C:H films in CH4–CO2 plasma: Gas composition and substrate biasing effects on the film structure and growth process

(2007) G. Gottardi et al.   THIN SOLID FILMS

A comparative study of plasma parameters and gas phase compositions in Cl2 and HCl direct current glow discharges

(2007) A.M. Efremov et al.   THIN SOLID FILMS