4.7 Article

Patterning microfluidic device wettability with spatially-controlled plasma oxidation

期刊

LAB ON A CHIP
卷 15, 期 15, 页码 3163-3169

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c5lc00626k

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资金

  1. NSF CAREER Award [DBI-1253293]
  2. NIH New Innovator Award [1DP2AR068129-01, R01 1R01EB019453-01]
  3. Defence Advanced Research Projects Agency [HR0011-12-C-0065, N66001-12-C-4211, DE-AC02-05CH11231]
  4. Direct For Biological Sciences [1253293] Funding Source: National Science Foundation
  5. Div Of Biological Infrastructure [1253293] Funding Source: National Science Foundation

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Microfluidic devices can form double emulsions with uniform properties, but require cumbersome fabrication steps to pattern their wettability. We demonstrate spatially-controlled plasma oxidation to create wettability patterns for forming double emulsions. Our method performs comparably to chemical techniques but is simpler, more reliable, and scalable to patterning large arrays of drop makers.

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