PLASMA CHEMISTRY AND PLASMA PROCESSING

期刊名

PLASMA CHEMISTRY AND PLASMA PROCESSING

PLASMA CHEM PLASMA P

ISSN / eISSN

0272-4324 / 1572-8986

目标和范围

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

研究方向

工程：化工

物理：应用

物理：流体与等离子体

CiteScore

6.20 查看趋势图

CiteScore 学科排名

类别	分区	排名
Physics and Astronomy - Condensed Matter Physics	Q1	#95/423
Physics and Astronomy - Surfaces, Coatings and Films	Q1	#33/131
Physics and Astronomy - General Chemical Engineering	Q2	#70/272
Physics and Astronomy - General Chemistry	Q2	#108/407

Web of Science 核心合集

Science Citation Index Expanded (SCIE)	Social Sciences Citation Index (SSCI)
Indexed	-

类别 (Journal Citation Reports 2023)	分区
ENGINEERING, CHEMICAL - SCIE	Q2
PHYSICS, APPLIED - SCIE	Q2
PHYSICS, FLUIDS & PLASMAS - SCIE	Q1

H-index

57

出版国家或地区

UNITED STATES

出版商

Springer US

出版周期

Quarterly

出版年份

1981

年文章数

85

Open Access

NO

通讯方式

SPRINGER, 233 SPRING ST, NEW YORK, USA, NY, 10013