Robustly Stable Ferroelectric Polarization States Enable Long-Term Nonvolatile Storage against Radiation in HfO2-Based Ferroelectric Field-Effect Transistors

Title
Robustly Stable Ferroelectric Polarization States Enable Long-Term Nonvolatile Storage against Radiation in HfO2-Based Ferroelectric Field-Effect Transistors
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume -, Issue -, Pages -
Publisher
American Chemical Society (ACS)
Online
2022-11-02
DOI
10.1021/acsami.2c13392

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