Robustly Stable Ferroelectric Polarization States Enable Long-Term Nonvolatile Storage against Radiation in HfO2-Based Ferroelectric Field-Effect Transistors
Published 2022 View Full Article
- Home
- Publications
- Publication Search
- Publication Details
Title
Robustly Stable Ferroelectric Polarization States Enable Long-Term Nonvolatile Storage against Radiation in HfO2-Based Ferroelectric Field-Effect Transistors
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume -, Issue -, Pages -
Publisher
American Chemical Society (ACS)
Online
2022-11-02
DOI
10.1021/acsami.2c13392
References
Ask authors/readers for more resources
Related references
Note: Only part of the references are listed.- Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors
- (2022) Suraj S. Cheema et al. NATURE
- The fundamentals and applications of ferroelectric HfO2
- (2022) Uwe Schroeder et al. Nature Reviews Materials
- Electric Field Gradient‐Controlled Domain Switching for Size Effect‐Resistant Multilevel Operations in HfO 2 ‐Based Ferroelectric Field‐Effect Transistor
- (2021) Binjian Zeng et al. ADVANCED FUNCTIONAL MATERIALS
- Low-power electronic technologies for harsh radiation environments
- (2021) Jeffrey Prinzie et al. Nature Electronics
- Hf0.5Zr0.5O₂-Based Ferroelectric Field-Effect Transistors With HfO₂ Seed Layers for Radiation-Hard Nonvolatile Memory Applications
- (2021) Chen Liu et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Robustly stable intermediate memory states in HfO2−based ferroelectric field−effect transistors
- (2021) Chen Liu et al. Journal of Materiomics
- Reconfigurable frequency multiplication with a ferroelectric transistor
- (2020) Halid Mulaosmanovic et al. Nature Electronics
- The future of ferroelectric field-effect transistor technology
- (2020) Asif Islam Khan et al. Nature Electronics
- Ionizing Radiation Effect on Memory Characteristics for HfO2-Based Ferroelectric Field-Effect Transistors
- (2019) Kuen-Yi Chen et al. IEEE ELECTRON DEVICE LETTERS
- Total ionizing dose effects of 60Co γ-rays radiation on HfxZr1−xO2 ferroelectric thin film capacitors
- (2019) Qi Sun et al. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
- A Study of Endurance Issues in HfO2-Based Ferroelectric Field Effect Transistors: Charge Trapping and Trap Generation
- (2018) Nanbo Gong et al. IEEE ELECTRON DEVICE LETTERS
- HfO2-Based Highly Stable Radiation-Immune Ferroelectric Memory
- (2017) Fei Huang et al. IEEE ELECTRON DEVICE LETTERS
- Why Is FE–HfO2More Suitable Than PZT or SBT for Scaled Nonvolatile 1-T Memory Cell? A Retention Perspective
- (2016) Nanbo Gong et al. IEEE ELECTRON DEVICE LETTERS
- Modeling and simulation of ionizing radiation effect on ferroelectric field-effect transistor
- (2016) Shaoan Yan et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Effect of top electrode material on radiation-induced degradation of ferroelectric thin film structures
- (2016) Steven J. Brewer et al. JOURNAL OF APPLIED PHYSICS
- Impact of total ionizing dose irradiation on Pt/SrBi2Ta2O9/HfTaO/Si memory capacitors
- (2015) S. A. Yan et al. APPLIED PHYSICS LETTERS
- Ionizing radiation effect on metal–ferroelectric–insulator–semiconductor memory capacitors
- (2015) S A Yan et al. SEMICONDUCTOR SCIENCE AND TECHNOLOGY
- Impact of total ionizing dose irradiation on electrical property of ferroelectric-gate field-effect transistor
- (2014) S. A. Yan et al. JOURNAL OF APPLIED PHYSICS
- Overview of emerging nonvolatile memory technologies
- (2014) Jagan Meena et al. Nanoscale Research Letters
- Radiation Effects in Flash Memories
- (2013) S. Gerardin et al. IEEE TRANSACTIONS ON NUCLEAR SCIENCE
- Ferroelectricity in hafnium oxide thin films
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
- Effects of electron irradiation on the ferroelectric 180° in-plane nanostripe domain structure in a thin film prepared from a bulk single crystal of BaTiO3 by focused ion beam
- (2011) Takao Matsumoto et al. JOURNAL OF APPLIED PHYSICS
- Ferroelectric Field Effect Transistors for Memory Applications
- (2010) Jason Hoffman et al. ADVANCED MATERIALS
- Radiation Effects in MOS Oxides
- (2008) James R. Schwank et al. IEEE TRANSACTIONS ON NUCLEAR SCIENCE
- MATERIALS SCIENCE: Who Wins the Nonvolatile Memory Race?
- (2008) G. I. Meijer SCIENCE
Create your own webinar
Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.
Create NowBecome a Peeref-certified reviewer
The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.
Get Started