Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 54, Issue 1, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.7567/JJAP.54.01AA02
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Funding
- JSPS KAKENHI [25800309]
- Grants-in-Aid for Scientific Research [25287157, 24108006, 25800309] Funding Source: KAKEN
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Atmospheric pressure chemical vapor deposition (APCVD) has preferable properties to the mass production of carbon nanomaterials. Here, we describe a specially-designed microwave-excited atmospheric pressure plasma jet (MW-APPJ) with a 10-mm-wide nozzle based on microstrip line. The MW-APPJ is applied to an APCVD process and nanocrystalline diamond films are successfully deposited on silicon substrates using a mixture gas of Ar/CH4/H-2 even in ambient air. The MW-APPJ technology could be suitable for the large-area APCVD system for the synthesis of carbon nanomaterials due to its arrayed configuration for the enlargement of plasma area. (C) 2015 The Japan Society of Applied Physics
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